| 1 |
Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition
Kwak I, Kavrik M, Park JH, Grissom L, Fruhberger B, Wong KT, Kang S, Kummel AC
Applied Surface Science, 463, 758, 2019 |
| 2 |
Characterization and optimization of MIS-HEMTs device of high similar to k dielectric material on quaternary barrier of Al0.42In0.03Ga0.55N/UID-AIN/GaN/GaN heterostructure for high power switching application
Tarauni YU, Thiruvadigal DJ, Joseph HB
Applied Surface Science, 488, 427, 2019 |
| 3 |
Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe2
Lin YS, Kwak I, Chung TF, Yang JR, Kummel AC, Chen MJ
Applied Surface Science, 492, 239, 2019 |
| 4 |
Interface chemistry and surface morphology evolution study for InAs/Al2O3 stacks upon in situ ultrahigh vacuum annealing
Wang XL, Qin XY, Wang W, Liu Y, Shi XR, Sun Y, Liu C, Zhao JL, Zhang GH, Liu H, Cho KJ, Wu R, Wang J, Zhang S, Wallace RM, Dong H
Applied Surface Science, 443, 567, 2018 |
| 5 |
Synthesis and effect of Ba2+ ions on the dielectric properties of the layered-perovskite KSr2NaNb4O13 ceramics
Im M, Kim DH, Kweon SH, Lee WH, Nahm S
Materials Research Bulletin, 105, 246, 2018 |
| 6 |
Very high frequency plasma reactant for atomic layer deposition
Oh IK, Yoo G, Yoon CM, Kim TH, Yeom GY, Kim K, Lee Z, Jung H, Lee CW, Kim H, Lee HBR
Applied Surface Science, 387, 109, 2016 |
| 7 |
Controllable growth of stable germanium dioxide ultra-thin layer by means of capacitively driven radio frequency discharge
Svarnas P, Botzakaki MA, Skoulatakis G, Kennou S, Ladas S, Tsamis C, Georga SN, Krontiras CA
Thin Solid Films, 599, 49, 2016 |
| 8 |
XPS study on the effects of thermal annealing on CeO2/La2O3 stacked gate dielectrics
Zhang JQ, Wong H, Kakushima K, Iwai H
Thin Solid Films, 600, 30, 2016 |
| 9 |
A comparative study of charge trapping in HfO2/Al2O3 and ZrO2/Al2O3 based multilayered metal/high-k/oxide/Si structures
Spassov D, Skeparovski A, Paskaleva A, Novkovski N
Thin Solid Films, 614, 7, 2016 |
| 10 |
Optical, structural and electrical characterizations of stacked Hf-based and silicon nitride dielectrics
Khomenkova L, Normand P, Gourbilleau F, Slaoui A, Bonafos C
Thin Solid Films, 617, 143, 2016 |
