| 1 |
Diamond like carbon films with embedded Cu nanoclusters deposited by reactive high power impulse magnetron sputtering: Pulse length effects
Meskinis S, Vasiliauskas A, Andrulevicius M, Jurkeviciute A, Peckus D, Tamulevicius S
Thin Solid Films, 673, 1, 2019 |
| 2 |
Structure and density profile of diamond-like carbon films containing copper: Study by X-ray reflectivity, transmission electron microscopy, and spectroscopic ellipsometry
Jurkeviciute A, Lazauskas A, Tamulevicius T, Vasiliauskas A, Peckus D, Meskinis S, Tamulevicius S
Thin Solid Films, 630, 48, 2017 |
| 3 |
Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Ar
Greczynski G, Zhirkov I, Petrov I, Greene JE, Rosen J
Thin Solid Films, 642, 36, 2017 |
| 4 |
Strain-free, single-phase metastable Ti0.38Al0.62N alloys with high hardness: metal-ion energy vs. momentum effects during film growth by hybrid high-power pulsed/dc magnetron cosputtering
Greczynski G, Lu J, Jensen J, Petrov I, Greene JE, Bolz S, Kolker W, Schiffers C, Lemmer O, Hultman L
Thin Solid Films, 556, 87, 2014 |
| 5 |
Microstructure and surface properties of chromium-doped diamond-like carbon thin films fabricated by high power pulsed magnetron sputtering
Wu ZZ, Tian XB, Gui G, Gong CZ, Yang SQ, Chu PK
Applied Surface Science, 276, 31, 2013 |
| 6 |
Low temperature synthesis of Mo2BC thin films
Bolvardi H, Emmerlich J, Mraz S, Arndt M, Rudigier H, Schneider JM
Thin Solid Films, 542, 5, 2013 |
| 7 |
Enhancement of Ti-containing hydrogenated carbon (Ti-C:H) films by high-power plasma-sputtering
Gwo J, Chu CL, Tsai MJ, Lee S
Applied Surface Science, 258(8), 3433, 2012 |
| 8 |
ZrB2 thin films grown by high power impulse magnetron sputtering from a compound target
Samuelsson M, Jensen J, Helmersson U, Hultman L, Hogberg H
Thin Solid Films, 526, 163, 2012 |
| 9 |
Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition
Wu ZZ, Tian XB, Wang ZM, Gong CZ, Yang SQ, Tan CM, Chu PK
Applied Surface Science, 258(1), 242, 2011 |
| 10 |
Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
Greczynski G, Jensen J, Hultman L
Thin Solid Films, 519(19), 6354, 2011 |
