1 |
High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition Takenaka K, Setsuhara Y, Han JG, Uchida G, Ebe A Thin Solid Films, 685, 306, 2019 |
2 |
Thick HS-PVD (Al,Cr)(2)O-3 coatings for challenging cutting and die casting applications Bobzin K, Brogelmann T, Kalscheuer C, Welters M Thin Solid Films, 663, 131, 2018 |
3 |
Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices Oka N, Watanabe M, Sugie K, Iwabuchi Y, Kotsubo H, Shigesato Y Thin Solid Films, 532, 1, 2013 |
4 |
High-rate deposition of high-quality Sn-doped In2O3 films by reactive magnetron sputtering using alloy targets Oka N, Kawase Y, Shigesato Y Thin Solid Films, 520(12), 4101, 2012 |
5 |
High-rate deposition and mechanical properties of SiOx film at low temperature by plasma enhanced chemical vapor deposition with the dual frequencies ultra high frequency and high frequency Jin SB, Lee JS, Choi YS, Choi IS, Han JG Thin Solid Films, 519(19), 6334, 2011 |
6 |
Room-Temperature Silicon Nitrides Prepared with Very High Rates (> 50 nm/s) in Atmospheric-Pressure Very High-Frequency Plasma Kakiuchi H, Ohmi H, Nakamura K, Yamaguchi Y, Yasutake K Plasma Chemistry and Plasma Processing, 30(5), 579, 2010 |
7 |
Ultrafast deposition of microcrystalline silicon films using high-density microwave plasma Jia H, Kuraseko H, Fujiwara H, Kondo M Solar Energy Materials and Solar Cells, 93(6-7), 812, 2009 |
8 |
Growth of crystallized ge films from VHF inductively-coupled plasma of H-2-diluted GeH4 Sakata T, Makihara K, Murakami H, Higashi S, Miyazaki S Thin Solid Films, 515(12), 4971, 2007 |
9 |
High-rate microcrystalline silicon deposition for p-i-n junction solar cells Matsui T, Matsuda A, Kondo M Solar Energy Materials and Solar Cells, 90(18-19), 3199, 2006 |
10 |
Key issues for fabrication of high quality amorphous and micro crystalline silicon solar cells Kondo M, Matsui T, Nasuno Y, Sonobe H, Shimizu S Thin Solid Films, 501(1-2), 243, 2006 |