검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Effects of deposition conditions on step-coverage quality in low-pressure chemical vapor deposition of HfO2 Ohshita Y, Ogura A, Hoshino A, Suzuki T, Hiiro S, Machida H Journal of Crystal Growth, 235(1-4), 365, 2002 |
| 2 |
Using tetrakis-diethylamido-hafnium for HfO2 thin-film growth in low-pressure chemical vapor deposition Ohshita Y, Ogura A, Hoshino A, Hiiro S, Suzuki T, Machida H Thin Solid Films, 406(1-2), 215, 2002 |
| 3 |
Hf1-xSixO2 deposition by metal organic chemical vapor deposition using the Hf(NEt2)(4)/SiH(NEt2)(3)/O-2 gas system Ohshita Y, Ogura A, Ishikawa M, Hoshino A, Hiiro S, Suzuki T, Machida H Thin Solid Films, 416(1-2), 208, 2002 |
| 4 |
HfO2 growth by low-pressure chemical vapor deposition using the Hf(N(C2H5)(2))(4)/O-2 gas system Ohshita Y, Ogura A, Hoshino A, Hiiro S, Machida H Journal of Crystal Growth, 233(1-2), 292, 2001 |
| 5 |
Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum Ohshita Y, Ogura A, Hoshino A, Hiiro S, Machida H Journal of Crystal Growth, 220(4), 604, 2000 |