검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Controlled crack propagation for atomic precision handling of wafer-scale two-dimensional materials Shim J, Bae SH, Kong W, Lee D, Qiao K, Nezich D, Park YJ, Zhao RK, Sundaram S, Li X, Yeon H, Choi C, Kum H, Yue RY, Zhou GY, Ou YB, Lee K, Moodera J, Zhao XH, Ahn JH, Hinkle C, Ougazzaden A, Kim J Science, 362(6415), 665, 2018 |
| 2 |
Effect of N-2 plasma on yttrium oxide and yttrium-oxynitride dielectrics Niu D, Ashcraft RW, Hinkle C, Parsons GN Journal of Vacuum Science & Technology A, 22(3), 445, 2004 |
| 3 |
Remote plasma-assisted nitridation (RPN): applications to Zr and Hf silicate alloys and Al2O3 Hinkle C, Lucovsky G Applied Surface Science, 216(1-4), 124, 2003 |
| 4 |
Electron trapping in noncrystalline remote plasma deposited Hf-aluminate alloys for gate dielectric applications Johnson RS, Hong JG, Hinkle C, Lucovsky G Journal of Vacuum Science & Technology B, 20(3), 1126, 2002 |
| 5 |
Electron trapping in non-crystalline Ta- and Hf-aluminates for gate dielectric applications in aggressively scaled silicon devices Johnson RS, Hong JG, Hinkle C, Lucovsky G Solid-State Electronics, 46(11), 1799, 2002 |