검색결과 : 26건
| No. | Article |
|---|---|
| 1 |
Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics Kim HC, Park SM, Hinsberg WD Chemical Reviews, 110(1), 146, 2010 |
| 2 |
Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers Cheng JY, Rettner CT, Sanders DP, Kim HC, Hinsberg WD Advanced Materials, 20(16), 3155, 2008 |
| 3 |
Surface patterns from block copolymer self-assembly Kim HC, Hinsberg WD Journal of Vacuum Science & Technology A, 26(6), 1369, 2008 |
| 4 |
Fourier transform infrared spectroscopy studies of water-polymer interactions in chemically amplified photoresists McDonough LA, Chikan V, Kim ZH, Leone SR, Hinsberg WD Journal of Vacuum Science & Technology B, 23(2), 344, 2005 |
| 5 |
Chemical mapping of polymer photoresists by scanning transmission x-ray microscopy Muntean L, Planques R, Kilcoyne ALD, Leone SR, Gilles MK, Hinsberg WD Journal of Vacuum Science & Technology B, 23(4), 1630, 2005 |
| 6 |
Chemical imaging of photoresists with coherent anti-Stokes Raman scattering (CARS) microscopy Potma EO, Xie XS, Muntean L, Preusser J, Jones D, Ye J, Leone SR, Hinsberg WD, Schade W Journal of Physical Chemistry B, 108(4), 1296, 2004 |
| 7 |
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging Houle FA, Hinsberg WD, Sanchez MI Journal of Vacuum Science & Technology B, 22(2), 747, 2004 |
| 8 |
Sub-50 nm half-pitch imaging,with a low activation energy chemically amplified photoresist Wallraff GM, Medeiros DR, Sanchez M, Petrillo K, Huang WS, Rettner C, Davis B, Larson CE, Sundberg L, Brock PJ, Hinsberg WD, Houle FA, Hoffnagle JA, Goldfarb D, Temple K, Wind S, Bucchignano J Journal of Vacuum Science & Technology B, 22(6), 3479, 2004 |
| 9 |
Water vapor uptake in photolithographic polymers observed by infrared near-field scanning optical microscopy in a controlled environment McDonough LA, Dragnea B, Preusser J, Leone SR, Hinsberg WD Journal of Physical Chemistry B, 107(21), 4951, 2003 |
| 10 |
Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists Hinsberg WD, Houle FA, Poliskie GM, Pearson D, Sanchez MI, Ito H Journal of Physical Chemistry A, 106(42), 9776, 2002 |