검색결과 : 1건
No. | Article |
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1 |
Damage-free microwave-excited plasma etching without carrier deactivation of heavily doped Si under thin silicide layer Goto T, Ikenaga K, Teramoto A, Hirayarna M, Sugawa S, Ohmi T Journal of Vacuum Science & Technology A, 26(1), 8, 2008 |