검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation Hiroshima H, Wang Q, Youn SW Journal of Vacuum Science & Technology B, 28(6), C6M12, 2010 |
| 2 |
Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithography Wang Q, Hiroshima H, Atobe H, Youn SW Journal of Vacuum Science & Technology B, 28(6), C6M125, 2010 |
| 3 |
Release force reduction in UV nanoimprint by mold orientation control and by gas environment Hiroshima H Journal of Vacuum Science & Technology B, 27(6), 2862, 2009 |
| 4 |
Numerical study on bubble trapping in UV nanoimprint lithography Morihara D, Nagaoka Y, Hiroshima H, Hirai Y Journal of Vacuum Science & Technology B, 27(6), 2866, 2009 |
| 5 |
UV-nanoimprint with the assistance of gas condensation at atmospheric environmental pressure Hiroshima H, Komuro M Journal of Vacuum Science & Technology B, 25(6), 2333, 2007 |
| 6 |
Fabrication of trilayer resist using photocuring-imprint lithography Kim SH, Hiroshima H, Inoue S, Kurashima Y, Komuro M Journal of Vacuum Science & Technology B, 21(6), 3144, 2003 |
| 7 |
Room temperature replication in spin on glass by nanoimprint technology Matsui S, Igaku Y, Ishigaki H, Fujita J, Ishida M, Ochiai Y, Komuro M, Hiroshima H Journal of Vacuum Science & Technology B, 19(6), 2801, 2001 |
| 8 |
Fabrication technology of a Si nanowire memory transistor using an inorganic electron beam resist process Tsutsumi T, Ishii K, Hiroshima H, Hazra S, Yamanaka M, Sakata I, Taguchi H, Suzuki E, Tomizawa K Journal of Vacuum Science & Technology B, 18(6), 2640, 2000 |
| 9 |
The use of a Si-based resist system and Ti electrode for the fabrication of sub-10 nm metal-insulator-metal tunnel junctions Wada T, Haraichi S, Ishii K, Hiroshima H, Komuro M, Gorwadkar SM Journal of Vacuum Science & Technology A, 16(3), 1430, 1998 |
| 10 |
Electron-Beam Dot Lithography for Nanometer-Scale Tunnel-Junctions Using a Double-Layered Inorganic Resist Haraichi S, Wada T, Gorwadkar SM, Ishii K, Hiroshima H Journal of Vacuum Science & Technology B, 15(4), 1406, 1997 |