검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor van Hemmen JL, Heil SBS, Klootwijk JH, Roozeboom F, Hodson CJ, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 154(7), G165, 2007 |
| 2 |
Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor Heil SBS, van Hemmen JL, Hodson CJ, Singh N, Klootwijk JH, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 25(5), 1357, 2007 |