검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Sub-50 nm half-pitch imaging,with a low activation energy chemically amplified photoresist Wallraff GM, Medeiros DR, Sanchez M, Petrillo K, Huang WS, Rettner C, Davis B, Larson CE, Sundberg L, Brock PJ, Hinsberg WD, Houle FA, Hoffnagle JA, Goldfarb D, Temple K, Wind S, Bucchignano J Journal of Vacuum Science & Technology B, 22(6), 3479, 2004 |
| 2 |
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist Houle FA, Hinsberg WD, Sanchez MI, Hoffnagle JA Journal of Vacuum Science & Technology B, 20(3), 924, 2002 |
| 3 |
Liquid immersion deep-ultraviolet interferometric lithography Hoffnagle JA, Hinsberg WD, Sanchez M, Houle FA Journal of Vacuum Science & Technology B, 17(6), 3306, 1999 |