검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Properties of Ultrathin High Permittivity (Nb1-xTax)(2)O-5 Films Prepared by Aqueous Chemical Solution Deposition Hardy A, Van Elshocht S, Dewulf D, Clima S, Peys N, Adelmann C, Opsomer K, Favia P, Bender H, Hoflijk I, Conard T, Franquet A, Van den Rul H, Kittl JA, De Gendt S, Van Bael MK, Mullens J Journal of the Electrochemical Society, 157(1), G13, 2010 |
| 2 |
Shallow junction ion implantation in Ge and associated defect control Satta A, Simoen E, Janssens T, Clarysse T, De Jaeger B, Benedetti A, Hoflijk I, Brijs B, Meuris M, Vandervorst W Journal of the Electrochemical Society, 153(3), G229, 2006 |
| 3 |
Active dopant characterization methodology for germanium Clarysse T, Eyben P, Janssens T, Hoflijk I, Vanhaeren D, Satta A, Meuris M, Vandervorst W, Bogdanowicz J, Raskin G Journal of Vacuum Science & Technology B, 24(1), 381, 2006 |
| 4 |
P implantation doping of Ge: Diffusion, activation, and recrystallization Satta A, Janssens T, Clarysse T, Simoen E, Meuris M, Benedetti A, Hoflijk I, De Jaeger B, Demeurisse C, Vandervorst W Journal of Vacuum Science & Technology B, 24(1), 494, 2006 |
| 5 |
Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates Van Elshocht S, Caymax M, Conard T, De Gendt S, Hoflijk I, Houssa M, Leys F, Bonzom R, De Jaeger B, Van Steenbergen J, Vandervorst W, Heyns M, Meuris M Thin Solid Films, 508(1-2), 1, 2006 |
| 6 |
Chemical and electrical dopants profile evolution during solid phase epitaxial regrowth Pawlak BJ, Lindsay R, Surdeanu R, Dieu B, Geenen L, Hoflijk I, Richard O, Duffy R, Clarysse T, Brijs B, Vandervorst W, Dachs CJJ Journal of Vacuum Science & Technology B, 22(1), 297, 2004 |
| 7 |
Metal film characterization with qualified spreading resistance Clarysse T, Hoflijk I, Zhang W, Maex K, Vandervorst W Journal of Vacuum Science & Technology B, 22(1), 444, 2004 |