검색결과 : 3건
No. | Article |
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1 |
Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties Wojcik H, Junige M, Bartha W, Albert M, Neumann V, Merkel U, Peeva A, Gluch J, Menzel S, Munnik F, Liske R, Utess D, Richter I, Klein C, Engelmann HJ, Ho P, Hossbach C, Wenzel C Journal of the Electrochemical Society, 159(2), H166, 2012 |
2 |
Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source Schmidt D, Knaut M, Hossbach C, Albert M, Dussarrat C, Hintze B, Bartha JW Journal of the Electrochemical Society, 157(6), H638, 2010 |
3 |
Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films Hossbach C, Teichert S, Thomas J, Wilde L, Wojcik H, Schmidt D, Adolphi B, Bertram M, Muhle U, Albert M, Menzel S, Hintze B, Bartha JW Journal of the Electrochemical Society, 156(11), H852, 2009 |