화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties
Wojcik H, Junige M, Bartha W, Albert M, Neumann V, Merkel U, Peeva A, Gluch J, Menzel S, Munnik F, Liske R, Utess D, Richter I, Klein C, Engelmann HJ, Ho P, Hossbach C, Wenzel C
Journal of the Electrochemical Society, 159(2), H166, 2012
2 Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source
Schmidt D, Knaut M, Hossbach C, Albert M, Dussarrat C, Hintze B, Bartha JW
Journal of the Electrochemical Society, 157(6), H638, 2010
3 Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
Hossbach C, Teichert S, Thomas J, Wilde L, Wojcik H, Schmidt D, Adolphi B, Bertram M, Muhle U, Albert M, Menzel S, Hintze B, Bartha JW
Journal of the Electrochemical Society, 156(11), H852, 2009