화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Plasma-induced surface segregation and oxidation in nickel-iron thin films
Hsiao R, Mauri D
Applied Surface Science, 157(3), 185, 2000
2 Anisotropic Etching of a Novalak-Based Polymer at Cryogenic Temperature
Hsiao R, Yu K, Fan LS, Pandhumsopom T, Sanitini H, Macdonald SA, Robertson N
Journal of the Electrochemical Society, 144(3), 1008, 1997
3 Tantalum Plasma-Etching with Minimum Effect on Underlying Nickel-Iron Thin-Film
Hsiao R, Miller D, Lin T, Robertson N
Thin Solid Films, 304(1-2), 381, 1997
4 Etching of Tantalum in Fluorine-Containing High-Density Plasmas
Hsiao R, Miller D
Journal of the Electrochemical Society, 143(10), 3266, 1996
5 Response-Surface Study of Resist Etching in High-Density Oxygen Plasma and Interactions of O-2 Plasma with NiFe, Cu, Ta, and Al2O3
Hsiao R, Miller D, Kellock A
Journal of Vacuum Science & Technology A, 14(3), 1028, 1996