1 |
Electrical properties correlated with redistributed deep states in a-Si:H thin-film transistors on flexible substrates undergoing mechanical bending Lee MH, Hsieh BF, Chang ST Thin Solid Films, 528, 82, 2013 |
2 |
Characterization of silicon-carbon alloy materials for future strained Si metal oxide semiconductor field effect transistors Hsieh BF, Chang ST, Lee MH Thin Solid Films, 529, 444, 2013 |
3 |
Uniaxial stress effect and hole mobility in high-Ge content strained SiGe (110) P-channel metal oxide semiconductor field effect transistors Cheng SY, Lee MH, Chang ST, Lin CY, Chen KT, Hsieh BF Thin Solid Films, 544, 487, 2013 |
4 |
A simulation study of thin film tandem solar cells with a nanoplate absorber bottom cell Chang ST, Hsieh BF, Liu YC Thin Solid Films, 520(8), 3369, 2012 |
5 |
Nickel Schottky junction on epi-Ge for strained Ge metal-oxide-semiconductor field-effect transistors source/drain engineering Lee MH, Hsieh BF, Chang ST, Lee SW Thin Solid Films, 520(8), 3379, 2012 |
6 |
Effect of layout arrangements on strained n-type metal-oxide-semiconductor field-effect transistors with silicon-carbon stressor Lee CC, Chang ST, Hsieh BF Thin Solid Films, 520(19), 6282, 2012 |
7 |
Subband structure and effective mass of relaxed and strained Ge (110) PMOSFETs Hsieh BF, Chang ST Solid-State Electronics, 60(1), 37, 2011 |
8 |
TCAD studies of novel nanoplate amorphous silicon alloy thin-film solar cells Chang ST, Hsieh BF Thin Solid Films, 520(5), 1612, 2011 |
9 |
Strain engineering of nanoscale Si MOS devices Huang J, Chang ST, Hsieh BF, Liao MH, Wang WC, Lee CC Thin Solid Films, 518, S241, 2010 |
10 |
Carrier backscattering characteristics of nanoscale strained complementary metal-oxide-semiconductor devices featuring the optimal stress engineering Chang ST, Liao MH, Lee CC, Huang JK, Wang WC, Hsieh BF Journal of Vacuum Science & Technology B, 27(3), 1261, 2009 |