화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Surface reaction probabilities of silicon hydride radicals in SiH4/H-2 thermal chemical vapor deposition
Hsin WC, Tsai DS, Shimogaki Y
Industrial & Engineering Chemistry Research, 41(9), 2129, 2002
2 Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition
Tsai DS, Chang TC, Hsin WC, Hamamura H, Shimogaki Y
Thin Solid Films, 411(2), 177, 2002