검색결과 : 2건
No. | Article |
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1 |
Surface reaction probabilities of silicon hydride radicals in SiH4/H-2 thermal chemical vapor deposition Hsin WC, Tsai DS, Shimogaki Y Industrial & Engineering Chemistry Research, 41(9), 2129, 2002 |
2 |
Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition Tsai DS, Chang TC, Hsin WC, Hamamura H, Shimogaki Y Thin Solid Films, 411(2), 177, 2002 |