화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 High Tensile Stress with Minimal Dopant Diffusion by Low Temperature Microwave Anneal
Lee YJ, Lu YL, Mu ZC, Hsueh FK, Chao TS, Wu CY
Electrochemical and Solid State Letters, 14(5), H191, 2011
2 Impacts of a buffer layer and hydrogen-annealed wafers on the performance of strained-channel nMOSFETs with SiN-capping layer
Tsai TI, Lin HC, Lee YJ, Chen KS, Wang J, Hsueh FK, Chao TS, Huang TY
Solid-State Electronics, 52(10), 1518, 2008