검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask Dreeskornfeld L, Haindl G, Kleineberg U, Heinzmann U, Shi F, Volland B, Rangelow IW, Majkova E, Luby S, Kostic, Matay L, Hrkut P, Hudek P, Lee HY Thin Solid Films, 458(1-2), 227, 2004 |
| 2 |
Micromachined atomic force microscopy sensor with integrated piezoresistive, sensor and thermal bimorph actuator for high-speed tapping-mode atomic force microscopy phase-imaging in higher eigenmodes Pedrak R, Ivanov T, Ivanova K, Gotszalk T, Abedinov N, Rangelow IW, Edinger K, Tomerov E, Schenkel T, Hudek P Journal of Vacuum Science & Technology B, 21(6), 3102, 2003 |
| 3 |
Mechanical, geometrical, and electrical characterization of silicon membranes for open stencil masks Sossna E, Degen A, Rangelow IW, Drzik M, Hudek P, Tiwald TE, Woollam JA Journal of Vacuum Science & Technology B, 19(6), 2665, 2001 |
| 4 |
Field emission arrays by silicon micromachining Debski T, Volland B, Barth W, Shi F, Hudek P, Rangelow IW, Grabiec P, Studzinska K, Zaborowski M, Mitura S Journal of Vacuum Science & Technology B, 18(2), 896, 2000 |
| 5 |
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment Volland B, Shi F, Heerlein H, Rangelow IW, Hudek P, Kostic I, Cekan E, Vonach H, Loeschner H, Horner C, Stengl G, Buschbeck H, Zeininger M, Bleeker A, Benschop J Journal of Vacuum Science & Technology B, 18(6), 3202, 2000 |
| 6 |
Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography Glezos N, Argitis P, Velessiotis D, Raptis I, Hatzakis M, Hudek P, Kostic I Journal of Vacuum Science & Technology B, 18(6), 3431, 2000 |
| 7 |
Progress on nanostructuring with Nanojet Voigt J, Shi F, Hudek P, Rangelow IW, Edinger K Journal of Vacuum Science & Technology B, 18(6), 3525, 2000 |
| 8 |
Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining Barth W, Debski T, Shi F, Hudek P, Kostic I, Rangelow IW, Biehl S, Iwert T, Grabiec P, Studzinska K, Mitura S, Bekh II, Lushkin AE, Il'chenko LG, Il'chenko VV, Haindl G Journal of Vacuum Science & Technology B, 18(6), 3544, 2000 |
| 9 |
Experimental results of the stochastic Coulomb interaction in ion projection lithography de Jager PWH, Derksen G, Mertens B, Cekan E, Lammer G, Vonach H, Buschbeck H, Zeininger M, Horner C, Loschner H, Stengl G, Bleeker AJ, Benschop J, Shi F, Volland B, Hudek P, Heerlein H, Rangelow IW, Kaesmaier R Journal of Vacuum Science & Technology B, 17(6), 3098, 1999 |
| 10 |
Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices Bruenger WH, Torkler M, Weiss M, Loschner H, Leung K, Lee Y, Hudek P, Rangelow IW, Stangl G, Fallmann W Journal of Vacuum Science & Technology B, 17(6), 3119, 1999 |