화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Growth and characterization of an In0.53Ga0.47As-based Metal-Oxide-Semiconductor Capacitor (MOSCAP) structure on 300 mm on-axis Si (001) wafers by MOCVD
Orzali T, Vert A, Kim TW, Hung PY, Herman JL, Vivekanand S, Huang GS, Kelman M, Karim Z, Hill RJW, Rao SSP
Journal of Crystal Growth, 427, 72, 2015
2 Evaluation of sampling techniques for detection and quantification of airborne legionellae at biological aeration basins and shower rooms
Chang CW, Hung PY
Journal of Aerosol Science, 48, 63, 2012
3 Impact of Oxygen on Work Function of Ru Oxide Metal Gate
Park CS, Bersuker G, Hung PY, Kirsch PD, Jammy R
Electrochemical and Solid State Letters, 13(4), H105, 2010
4 Evaluation of bioaerosol sampling techniques for Legionella pneumophila coupled with culture assay and quantitative PCR
Chang CW, Chou FC, Hung PY
Journal of Aerosol Science, 41(12), 1055, 2010
5 Modified NiSi/Si Schottky Barrier Height by Nitrogen Implantation
Kalra P, Vora N, Majhi P, Hung PY, Tseng HH, Jammy R, Liu TJK
Electrochemical and Solid State Letters, 12(1), H1, 2009
6 A comparison of thickness values for very thin SiO2 films by using ellipsometric, capacitance-voltage, and HRTEM measurements
Ehrstein J, Richter C, Chandler-Horowitz D, Vogel E, Young C, Shah S, Maher D, Foran B, Hung PY, Diebold A
Journal of the Electrochemical Society, 153(1), F12, 2006
7 Application of x-ray metrology in the characterization of metal gate thin films
Hung PY, Alshareef H, Lafford T, Bowen DK, Majhi P, Diebold A
Journal of Vacuum Science & Technology B, 24(5), 2437, 2006
8 X-ray reflectometry and x-ray fluorescence monitoring of the atomic layer deposition process for high-k gate dielectrics
Hung PY, Gondran C, Ghatak-Roy A, Terada S, Bunday B, Yeung H, Diebold A
Journal of Vacuum Science & Technology B, 23(5), 2244, 2005
9 Growth mechanism of TiN film on dielectric films and the effects on the work function
Choi K, Lysaght P, Alshareef H, Huffman C, Wen HC, Harris R, Luan H, Hung PY, Sparks C, Cruz M, Matthews K, Majhi P, Lee BH
Thin Solid Films, 486(1-2), 141, 2005
10 SIMS depth profiling of advanced gate dielectric materials
Bennett J, Gondran C, Sparks C, Hung PY, Hou A
Applied Surface Science, 203, 409, 2003