화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Cl-2-based inductively coupled plasma etching of NiFe and related materials
Jung KB, Lambers ES, Childress JR, Pearton SJ, Jenson M, Hurst AT
Journal of the Electrochemical Society, 145(11), 4025, 1998
2 Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCo
Jung KB, Lambers ES, Childress JR, Pearton SJ, Jenson M, Hurst AT
Journal of Vacuum Science & Technology A, 16(3), 1697, 1998