화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Effect of Ar in the source gas on the microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD
Wang DS, Liu QM, Li F, Qin YL, Liu DQ, Tang ZG, Peng SL, He DY
Applied Surface Science, 257(4), 1342, 2010
2 The influence of H-2/(H-2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD
Tang ZG, Wang WB, Zhou B, Wang DS, Peng SL, He DY
Applied Surface Science, 255(21), 8867, 2009
3 Temperature dependence of absorption coefficient spectra for mu c-Si films by resonant photothermal bending spectroscopy
Kunii T, Kitao J, Mori K, Yoshida N, Nonomura S
Solar Energy Materials and Solar Cells, 74(1-4), 415, 2002