화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Surface cleaning of copper by thermal and plasma treatment in reducing and inert ambients
Hymes S, Kumar KS, Murarka SP, Wang W, Lanford WA
Journal of Vacuum Science & Technology B, 16(3), 1107, 1998
2 Passivation of copper by low temperature annealing of Cu/Mg/SiO2 bilayers
Wang W, Ding PJ, Hymes S, Murarka SP, Lanford WA
Chemical Engineering Communications, 153, 253, 1996
3 Low-Temperature Passivation of Copper by Doping with Al or Mg
Lanford WA, Ding PJ, Wang W, Hymes S, Muraka SP
Thin Solid Films, 262(1-2), 234, 1995