검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application Seo ST, Lee KS, Yang DR Korean Journal of Chemical Engineering, 23(2), 199, 2006 |
| 2 |
Run-to-Run Control of Inductively Coupled C2F6 Plasma Etching of SiO2: Construction of a Numerical Process with a Computational Fluid Dynamics Code Seo ST, Lee YH, Lee KS, Choi BK, Yang DR Korean Journal of Chemical Engineering, 22(6), 822, 2005 |
| 3 |
Effect of halogen in high-density oxygen plasmas on photoresist trimming Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L AIChE Journal, 50(7), 1578, 2004 |