| 1 |
Accelerated ICP etching of 6H-SiC by femtosecond laser modification
Huang YG, Tang F, Guo Z, Wang XH
Applied Surface Science, 488, 853, 2019 |
| 2 |
High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
Gu XD, Liu ZW, Gunkel I, Chourou ST, Hong SW, Olynick DL, Russell TP
Advanced Materials, 24(42), 5688, 2012 |
| 3 |
Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
Qiu RF, Lu H, Chen DJ, Zhang R, Zheng YD
Applied Surface Science, 257(7), 2700, 2011 |
| 4 |
Broadband and wide-angle antireflection subwavelength structures of Si by inductively coupled plasma etching using dewetted nanopatterns of Au thin films as masks
Leem JW, Yu JS
Thin Solid Films, 519(11), 3792, 2011 |
| 5 |
Effect of radio frequency power on the inductively coupled plasma etched Al0.65Ga0.35N surface
Bai Y, Liu J, Ma P, Li B, Zhu J, Guo LW, Liu XY
Applied Surface Science, 256(21), 6254, 2010 |
| 6 |
Dry etching characteristics of GaN using Cl-2/BCl3 inductively coupled plasmas
Zhou SJ, Cao B, Liu S
Applied Surface Science, 257(3), 905, 2010 |
| 7 |
Defect introduction in Ge during inductively coupled plasma etching and Schottky barrier diode fabrication processes
Auret FD, Coelho SMM, Myburg G, van Rensburg PJJ, Meyer WE
Thin Solid Films, 518(9), 2485, 2010 |
| 8 |
Fabrication of high-speed polyimide-based humidity sensor using anisotropic and isotropic etching with ICP
Kim JS, Lee MJ, Kang MS, Yoo KP, Kwon KH, Singh VR, Min NK
Thin Solid Films, 517(14), 3879, 2009 |
| 9 |
Physical properties and etching characteristics of metal (Al, Ag, Li) doped ZnO films grown by RF magnetron sputtering
Jeong SH, Yoo DG, Kim DY, Lee NE, Boo JH
Thin Solid Films, 516(19), 6598, 2008 |
| 10 |
Cl2/Ar 유도 결합 플라즈마를 이용한 NiFe, NiFeCo, Ta의 건식식각
라현욱, 박형조, 김기주, 김완영, 한윤봉
Korean Chemical Engineering Research, 43(1), 76, 2005 |
