화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Analysis of the Si(111) surface prepared in chemical vapor ambient for subsequent III-V heteroepitaxy
Zhao W, Steidl M, Paszuk A, Bruckner S, Dobrich A, Supplie O, Kleinschmidt P, Hannappel T
Applied Surface Science, 392, 1043, 2017
2 Si (001) surface preparation for the antiphase domain free heteroepitaxial growth of GaP on Si substrate
Kunert B, Nemeth I, Reinhard S, Volz K, Stolz W
Thin Solid Films, 517(1), 140, 2008
3 Heteroepitaxial technologies of III-V on Si
Kawanami H
Solar Energy Materials and Solar Cells, 66(1-4), 479, 2001