검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Influence of postdeposition annealing on structural properties and electrical characteristics of thin Tm2O3 and Tm2Ti2O7 dielectrics Pan TM, Yen LC Applied Surface Science, 256(9), 2786, 2010 |
| 2 |
Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivated Si(100) Mao AY, Son KA, Hess DA, Brown LA, White JM, Kwong DL, Roberts DA, Vrtis RN Thin Solid Films, 349(1-2), 230, 1999 |
| 3 |
Ultrathin Ta2O5 film growth by chemical vapor deposition of Ta(N(CH3)(2))(5) and O-2 on bare and SiOxNy-passivated Si(100) for gate dielectric applications Son KA, Mao AY, Kim BY, Liu F, Pylant ED, Hess DA, White JM, Kwong DL, Roberts DA, Vrtis RN Journal of Vacuum Science & Technology A, 16(3), 1670, 1998 |