검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Dielectric anisotropy and molecular orientation of fluorinated polymers confined in submicron trenches Cho TH, Lee JK, Ho PS, Ryan ET, Pellerin JG Journal of Vacuum Science & Technology B, 18(1), 208, 2000 |
| 2 |
Preparation and characterization of organic-inorganic hybrid materials via sol-gel reaction for interlayer dielectrics Baek NS, Song YB, Kim HK, Hwang SS, Hong SM Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, 349, 263, 2000 |
| 3 |
Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHCIF2 Labelle CB, Gleason KK Journal of Vacuum Science & Technology A, 17(2), 445, 1999 |
| 4 |
Integration of fluorinated amorphous carbon as low-dielectric constant insulator: Effects of heating and deposition of tantalum nitride Chang JP, Krautter HW, Zhu W, Opila RL, Pai CS Journal of Vacuum Science & Technology A, 17(5), 2969, 1999 |
| 5 |
Fluorinated amorphous carbon films for low permittivity interlevel dielectrics Theil JA Journal of Vacuum Science & Technology B, 17(6), 2397, 1999 |
| 6 |
Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh KS, Kang MS, Lee KM, Kim DS, Choi CK, Yun SM, Chang HY, Kim KH Thin Solid Films, 345(1), 45, 1999 |
| 7 |
[2.2]Paracyclophane으로부터 패릴린-N 박막의 저온 증착 김의정, 김선규, 박래학, 김주태 HWAHAK KONGHAK, 36(6), 896, 1998 |
| 8 |
SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun SM, Chang HY, Lee KM, Kim DC, Choi CK Journal of the Electrochemical Society, 145(7), 2576, 1998 |