1 |
Molecular dynamics study of the effect of substrate temperature and Ar ion assisted deposition on the deposition of amorphous TiO2 films Chen X, Zhang J, Zhao YQ Applied Surface Science, 404, 409, 2017 |
2 |
Effect of additional sample bias in Meshed Plasma Immersion Ion Deposition (MPIID) on microstructural, surface and mechanical properties of Si-DLC films Wu MZ, Tian XB, Li MQ, Gong CZ, Wei RH Applied Surface Science, 376, 26, 2016 |
3 |
A complementary survey of staircase voltammetry with metal ion deposition on macroelectrodes Krulic D, Fatouros N, Liu DY Journal of Electroanalytical Chemistry, 754, 30, 2015 |
4 |
Nanocrystalline SiC films prepared by direct deposition of carbon and silicon ions Semenov AV, Puzikov VM, Dobrotvorskaya MV, Fedorov AG, Lopin AV Thin Solid Films, 516(10), 2899, 2008 |
5 |
Investigation of properties of electric arc ion deposited TiN coating on Al2O3-based ceramic composite Zhang JH, Zhang QJ, Wu CL, Qin Y, Lee TC Journal of Adhesion Science and Technology, 17(6), 861, 2003 |
6 |
Fourier-transform infrared measurements of CHF3/O-2 discharges in an electron cyclotron resonance reactor Goeckner MJ, Goeckner NA Journal of Vacuum Science & Technology A, 17(5), 2586, 1999 |
7 |
Microstructure modification of silver films deposited by ionized magnetron sputter deposition Chiu KF, Blamire MG, Barber ZH Journal of Vacuum Science & Technology A, 17(5), 2891, 1999 |
8 |
Mass and Energy Measurements of the Species Responsible for CBN Growth in RF Bias Sputter Conditions Tsuda O, Tatebayashi Y, Yamadatakamura Y, Yoshida T Journal of Vacuum Science & Technology A, 15(6), 2859, 1997 |
9 |
Spatially Averaged (Global) Model of Time Modulated High-Density Argon Plasmas Ashida S, Lee C, Lieberman MA Journal of Vacuum Science & Technology A, 13(5), 2498, 1995 |