화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal-thermal-oxidation separation-by-implanted-oxygen wafers
Shimura T, Fukuda K, Yasutake K, Hosoi T, Umeno M
Thin Solid Films, 476(1), 125, 2005
2 SIMS study of oxygen in- and out-diffusion in SIMOX wafers during thermal annealing using O-18 implantation
Hayashi S, Sasaki T, Kawamura K, Matsumura A, Yanagihara K, Tanaka K
Applied Surface Science, 203, 504, 2003