| 1 |
Preliminary empirical results suggesting the mapping of dynamic in situ process signals to real-time wafer attributes in a plasma etch process
Rietman EA, Ibbotson DE, Lee JTC
Journal of Vacuum Science & Technology B, 16(1), 131, 1998 |
| 2 |
Polycide Gate Etching Using a Helical Resonator on an Applied Materials Precision-5000 Platform
Chang CP, Klemens FP, Maynard HL, Lee TC, Kornblit A, Ibbotson DE
Journal of Vacuum Science & Technology B, 15(3), 646, 1997 |
| 3 |
Plasma-Etching Endpointing by Monitoring Radiofrequency Power-Systems with an Artificial Neural-Network
Maynard HL, Rietman EA, Lee JT, Ibbotson DE
Journal of the Electrochemical Society, 143(6), 2029, 1996 |
| 4 |
Comparison of Advanced Plasma Sources for Etching Applications .5. Polysilicon Etching Rate, Uniformity, Profile Control, and Bulk Plasma Properties in a Helical Resonator Plasma Source
Lee JT, Layadi N, Guinn KV, Maynard HL, Klemens FP, Ibbotson DE, Tepermeister I, Egan PO, Richardson RA
Journal of Vacuum Science & Technology B, 14(4), 2510, 1996 |
| 5 |
Plasma-Etching Process-Development Using in-Situ Optical-Emission and Ellipsometry
Lee JT, Blayo N, Tepermeister I, Klemens FP, Mansfield WM, Ibbotson DE
Journal of Vacuum Science & Technology B, 14(5), 3283, 1996 |
| 6 |
Comparison of Advanced Plasma Sources for Etching Applications .4. Plasma-Induced Damage in a Helicon and a Multipole Electron-Cyclotron-Resonance Source
Blayo N, Tepermeister I, Benton JL, Higashi GS, Boone T, Onuoha A, Klemens FP, Ibbotson DE, Sawin HH
Journal of Vacuum Science & Technology B, 12(3), 1340, 1994 |
| 7 |
Comparison of Advanced Plasma Sources for Etching Applications .1. Etching Rate, Uniformity, and Profile Control in a Helicon and a Multiple Electron-Cyclotron-Resonance Source
Tepermeister I, Blayo N, Klemens FP, Ibbotson DE, Gottscho RA, Lee JT, Sawin HH
Journal of Vacuum Science & Technology B, 12(4), 2310, 1994 |
| 8 |
Comparison of Advanced Plasma Sources for Etching Applications .2. Langmuir Probe Studies of a Helicon and a Multipole Electron-Cyclotron-Resonance Source
Tepermeister I, Ibbotson DE, Lee JT, Sawin HH
Journal of Vacuum Science & Technology B, 12(4), 2322, 1994 |
| 9 |
Comparison of Advanced Plasma Sources for Etching Applications .3. Ion Energy-Distribution Functions for a Helicon and a Multipole Electron-Cyclotron-Resonance Source
Gibson GW, Sawin HH, Tepermeister I, Ibbotson DE, Lee JT
Journal of Vacuum Science & Technology B, 12(4), 2333, 1994 |
