화학공학소재연구정보센터
검색결과 : 16건
No. Article
1 Synthesis of high-quality monolayer graphene by low-power plasma
Hong HK, Kim NY, Yoon A, Lee SW, Park J, Yoo JW, Lee Z
Current Applied Physics, 19(1), 44, 2019
2 Effects of radio frequency power and gas ratio on barrier properties of SiOxNy films deposited by inductively coupled plasma chemical vapor deposition
Bang SH, Suk JH, Kim KS, Park JH, Hwang NM
Thin Solid Films, 669, 108, 2019
3 Synthesis of anode active material particles for lithium-ion batteries by surface modification via chemical vapor deposition and their electrochemical characteristics
Shimoi N
Advanced Powder Technology, 28(9), 2366, 2017
4 Impact of low-energy ions on plasma deposition of cubic boron nitride
Teii K, Matsumoto S
Thin Solid Films, 576, 50, 2015
5 다양한 금속 기판재료에 따른 그래핀의 유도결합 플라즈마 화학기상 성장 특성
김동옥, 트란남충, 김의태
Korean Journal of Materials Research, 24(12), 694, 2014
6 유도결합 플라즈마 화학기상증착법에 의해 활성화된 탄소원자를 이용한 Ni/SiO2/Si 기판에서 그래핀 성장
람반낭, 김의태
Korean Journal of Materials Research, 23(1), 47, 2013
7 Adhesion property of SiOx-doped Diamond-like Carbon Films Deposited on Polycarbonate by Inductively Coupled Plasma Chemical Vapor Deposition
Baek SM, Shirafuji T, Saito N, Takai O
Thin Solid Films, 519(20), 6678, 2011
8 Electron-emission properties of carbon nanotube micro-tips coated by amorphous carbon nitride films
Kim JP, Noh YR, Kim JU, Park JS
Thin Solid Films, 519(22), 7899, 2011
9 X-ray images obtained from cold cathodes using carbon nanotubes coated with gallium-doped zinc oxide thin films
Park JS, Kim JP, Noh YR, Jo KC, Lee SY, Choi HY, Kim JU
Thin Solid Films, 519(5), 1743, 2010
10 유도결합 플라즈마 화학기상증착법을 이용한 Ni/SiO2/Si 기판에서 그라핀 제조
박영수, 허훈회, 김의태
Korean Journal of Materials Research, 19(10), 522, 2009