| 1 |
유기 물질을 사용한 구리박막의 건식 식각에 대한 헥사플루오로이소프로판올 첨가의 영향
박성용, 임은택, 차문환, 이지수, 정지원
Korean Journal of Materials Research, 31(3), 162, 2021 |
| 2 |
Dry etching of copper thin films in high density plasma of CH3COOH/Ar
Ryu JS, Lim ET, Choi JS, Chung CW
Thin Solid Films, 672, 55, 2019 |
| 3 |
Etch characteristics of copper thin films in high density plasma of CH4/O-2/Ar gas mixture
Lim ET, Ryu JS, Chung CW
Thin Solid Films, 665, 51, 2018 |
| 4 |
Investigation on etching characteristics of Pd thin films using CH3COOH/Ar gas
Lee JY, Hwang SM, Choi JS, Cho DH, Chung CW
Thin Solid Films, 637, 37, 2017 |
| 5 |
Anisotropic etching of CoFeB magnetic thin films in C2H5OH/Ar plasma
Choi JS, Garay AA, Hwang SM, Lee JY, Cho DH, Chung CW
Thin Solid Films, 637, 49, 2017 |
| 6 |
Etch characteristics of Ru thin films using O-2/Ar, CH4/Ar, and O-2/CH4/Ar plasmas
Hwang SM, Garay AA, Choi JH, Chung CW
Thin Solid Films, 615, 311, 2016 |
| 7 |
Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma
Hwang SM, Garay A, Lee IH, Chung CW
Korean Journal of Chemical Engineering, 31(12), 2274, 2014 |
| 8 |
Inductively coupled plasma reactive ion etching of magnetic tunnel junction stacks using H2O/CH4 mixture
Lee TY, Lee IH, Chung CW
Thin Solid Films, 547, 146, 2013 |
| 9 |
Influence of twice-deposited etching mask layers on verticality of nanostructures
Liu ZH, Pan CT, Chao CH, Ou ZY, Li CC, Liu CY
Thin Solid Films, 520(22), 6757, 2012 |
| 10 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma
Kim EH, Lee TY, Min BC, Chung CW
Thin Solid Films, 521, 216, 2012 |
