검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Comparison of chlorine- and fluorine-based inductively coupled plasmas for dry etching of InGaZnO4 films Park JC, Jeong OG, Kim JK, Yun YH, Pearton SJ, Cho H Thin Solid Films, 546, 136, 2013 |
| 2 |
Optical emission diagnostics of etching of low-k dielectrics in a two frequency inductively coupled plasma Miyauchi M, Miyoshi Y, Petrovic ZL, Makabe T Solid-State Electronics, 51(10), 1418, 2007 |
| 3 |
Modeling injection of dense liquid sprays in radio frequency inductively coupled plasmas Shan YG, Mostaghimi J Plasma Chemistry and Plasma Processing, 25(3), 193, 2005 |
| 4 |
Comparison of plasma etch chemistries for MgO Baik KH, Park PY, Gila BP, Shin JH, Abernathy CR, Norasetthekul S, Luo B, Ren F, Lambers ES, Pearton SJ Applied Surface Science, 183(1-2), 26, 2001 |
| 5 |
Particle Densities and Nonequilibrium in a Low-Pressure Argon Plasma-Jet Fusselman SP, Yasuda HK Plasma Chemistry and Plasma Processing, 14(3), 251, 1994 |