화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 One-Step Synthesis of Silicon Oxynitride Films Using a Steady-State and High-Flux Helicon-Wave Excited Nitrogen Plasma
Huang TY, Jin CG, Yu J, Yang Y, Zhuge LJ, Wu XM, Sha ZD
Plasma Chemistry and Plasma Processing, 37(4), 1237, 2017
2 Ionized plasma vapor deposition and filtered arc deposition; processes, properties and applications
Martin PJ, Bendavid A, Takikawa H
Journal of Vacuum Science & Technology A, 17(4), 2351, 1999