화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Low hydrogen content silicon nitride films deposited at room temperature with an ECR plasma source
Isai GI, Holleman J, Wallinga H, Woerlee PH
Journal of the Electrochemical Society, 151(10), C649, 2004
2 Conduction and trapping mechanisms in SiO2 films grown near room temperature by multipolar electron cyclotron resonance plasma enhanced chemical vapor deposition
Isai GI, Holleman J, Wallinga H, Woerlee PH
Journal of Vacuum Science & Technology B, 22(3), 1022, 2004