검색결과 : 24건
No. | Article |
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1 |
Synthesis and property of noria (water-wheel like macrocycle) derivatives with pendant alkoxyl and adamantyl ester groups, and their application for extreme ultraviolet resist Niina N, Kudo H, Oizumi H, Itani T, Nishikubo T Thin Solid Films, 534, 459, 2013 |
2 |
Alternative developer solutions for extreme ultraviolet resist Itani T, Santillan JJ Journal of Vacuum Science & Technology B, 27(6), 2986, 2009 |
3 |
Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography Oizumi H, Kumise T, Itani T Journal of Vacuum Science & Technology B, 26(6), 2252, 2008 |
4 |
Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction Kozawa T, Tagawa S, Santillan JJ, Itani T Journal of Vacuum Science & Technology B, 26(6), 2257, 2008 |
5 |
Dissolution characteristics of chemically amplified extreme ultraviolet resist Itani T, Kaneyama K, Kozawa T, Tagawa S Journal of Vacuum Science & Technology B, 26(6), 2261, 2008 |
6 |
Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography Kozawa T, Tagawa S, Santillan JJ, Toriumi M, Itani T Journal of Vacuum Science & Technology B, 25(6), 2295, 2007 |
7 |
Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography Toriumi M, Santillan J, Itani T, Kozawa T, Tagawa S Journal of Vacuum Science & Technology B, 25(6), 2486, 2007 |
8 |
Epoxy-containing ArF resists with narrow molecular weight distribution Shirai M, Manabe M, Tsuji S, Itani T Journal of Vacuum Science & Technology B, 24(6), 3021, 2006 |
9 |
Overall water splitting on tungsten-based photocatalysts with defect pyrochlore structure Ikeda S, Itani T, Nango K, Matsumura M Catalysis Letters, 98(4), 229, 2004 |
10 |
Fluoropolymers for 157 nm single-layer resists Toriumi M, Ishikawa T, Kodani T, Koh M, Moriya T, Yamashita T, Araki T, Aoyama H, Yamazaki T, Furukawa T, Itani T Journal of Vacuum Science & Technology B, 22(1), 27, 2004 |