화학공학소재연구정보센터
검색결과 : 24건
No. Article
1 Synthesis and property of noria (water-wheel like macrocycle) derivatives with pendant alkoxyl and adamantyl ester groups, and their application for extreme ultraviolet resist
Niina N, Kudo H, Oizumi H, Itani T, Nishikubo T
Thin Solid Films, 534, 459, 2013
2 Alternative developer solutions for extreme ultraviolet resist
Itani T, Santillan JJ
Journal of Vacuum Science & Technology B, 27(6), 2986, 2009
3 Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography
Oizumi H, Kumise T, Itani T
Journal of Vacuum Science & Technology B, 26(6), 2252, 2008
4 Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction
Kozawa T, Tagawa S, Santillan JJ, Itani T
Journal of Vacuum Science & Technology B, 26(6), 2257, 2008
5 Dissolution characteristics of chemically amplified extreme ultraviolet resist
Itani T, Kaneyama K, Kozawa T, Tagawa S
Journal of Vacuum Science & Technology B, 26(6), 2261, 2008
6 Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography
Kozawa T, Tagawa S, Santillan JJ, Toriumi M, Itani T
Journal of Vacuum Science & Technology B, 25(6), 2295, 2007
7 Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography
Toriumi M, Santillan J, Itani T, Kozawa T, Tagawa S
Journal of Vacuum Science & Technology B, 25(6), 2486, 2007
8 Epoxy-containing ArF resists with narrow molecular weight distribution
Shirai M, Manabe M, Tsuji S, Itani T
Journal of Vacuum Science & Technology B, 24(6), 3021, 2006
9 Overall water splitting on tungsten-based photocatalysts with defect pyrochlore structure
Ikeda S, Itani T, Nango K, Matsumura M
Catalysis Letters, 98(4), 229, 2004
10 Fluoropolymers for 157 nm single-layer resists
Toriumi M, Ishikawa T, Kodani T, Koh M, Moriya T, Yamashita T, Araki T, Aoyama H, Yamazaki T, Furukawa T, Itani T
Journal of Vacuum Science & Technology B, 22(1), 27, 2004