검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Evolution of metal-compound residues on the walls of plasma etching reactor and their effect on critical dimensions of high-k/metal gate Iwakoshi T, Ono T, Aoyama T, Nara Y, Ohji Y Journal of Vacuum Science & Technology A, 27(3), 537, 2009 |
| 2 |
Prediction of etching results and etching stabilization by applying principal component regression to emission spectra during in-situ cleaning Iwakoshi T, Hirota K, Mori M, Tanaka J, Itabashi N Thin Solid Films, 516(11), 3464, 2008 |