검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Investigating oxygen flooding at oblique 2 and 1 keV oxygen sputtering for microelectronics support applications Jahnel F, von Criegern R Applied Surface Science, 203, 367, 2003 |
| 2 |
Verification of "lateral secondary ion mass spectrometry" as a method for measuring lateral dopant dose distributions in microelectronics test structures von Criegern R, Jahnel F, Lange-Gieseler R, Pearson P, Hobler G, Simionescu A Journal of Vacuum Science & Technology B, 16(1), 386, 1998 |
| 3 |
Verification of Models for the Simulation of Boron Implantation into Crystalline Silicon Hobler G, Simionescu A, Palmetshofer L, Jahnel F, Voncriegern R, Tian C, Stingeder G Journal of Vacuum Science & Technology B, 14(1), 272, 1996 |
| 4 |
Method for the Measurement of the Lateral Dose Distribution of Dopants at Implantation or Diffusion Mask Edges (Lateral SIMS) Voncriegern R, Jahnel F, Bianco M, Langegieseler R Journal of Vacuum Science & Technology B, 12(1), 234, 1994 |