화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 RAFT/PISA based Ni-NTA polymeric particles for virus-mimetic influenza vaccines
Lee CY, Hwang AR, Jose L, Park JH, Jang SA, Song JK, Kim YJ, Cho YY, Jeon HB, Jin JO, Paik HJ
Journal of Industrial and Engineering Chemistry, 86, 35, 2020
2 Engineering Butanol-Tolerance in Escherichia coli With Artificial Transcription Factor Libraries
Lee JY, Yang KS, Jang SA, Sung BH, Kim SC
Biotechnology and Bioengineering, 108(4), 742, 2011
3 Physical and antimicrobial properties of Gelidium corneum/nano-clay composite film containing grapefruit seed extract or thymol
Lim GO, Jang SA, Bin Song K
Journal of Food Engineering, 98(4), 415, 2010
4 High-level expression of an antimicrobial peptide histonin as a natural form by multimerization and furin-mediated cleavage
Kim JM, Jang SA, Yu BJ, Sung BH, Cho JH, Kim SC
Applied Microbiology and Biotechnology, 78(1), 123, 2008
5 Studies on the interfacial and crystallographic characteristics of Al2O3/SiO2/Si and ZrO2/SiO2/Si stacks
Kim JJ, Yang JM, Jang SA, Lim KY, Cho HJ, Lee SY, Kawasaki M
Journal of Vacuum Science & Technology B, 23(1), 144, 2005
6 Effect of gate hard mask and sidewall spacer structures on the gate oxide reliability of W/WNx/poly-Si gate MOSFET for high density DRAM applications
Lim KY, Cho HJ, Jang SA, Kim YS, Oh JG, Lee JH, Yang HS, Sohn HC, Kim JW
Journal of Vacuum Science & Technology B, 23(3), 1036, 2005
7 Investigation of stress behaviors and mechanism of void formation in sputtered TiSix films
Suh YS, Park DG, Jang SA
Thin Solid Films, 450(2), 341, 2004
8 Oxidation behavior of a patterned TiSi2/polysilicon stack
Kim TK, Jang SA, Yeo IS, Yang JM, Park TS, Park JW
Journal of Vacuum Science & Technology B, 19(2), 366, 2001
9 Abnormal oxidation of TiSi2 film in patterned TiSi2 /Polysilicon gate stack
Jang SA, Kim TK, Yang JM, Park TS, Park DG, Yeo IS, Park JW
Electrochemical and Solid State Letters, 3(11), 511, 2000
10 Control of the slope of field oxide edge and its effects on gate oxide reliability
Jang SA, Kim YB, Yeo IS, Lee SK
Journal of the Electrochemical Society, 146(1), 270, 1999