검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Chemical Mechanical Planarization of TaN Wafers Using Oxalic and Tartaric Acid Based Slurries Janjam SVSB, Peethala BC, Roy D, Babu SV Electrochemical and Solid State Letters, 13(1), II1, 2010 |
| 2 |
Electrochemical investigation of surface reactions for chemically promoted chemical mechanical polishing of TaN in tartaric acid solutions Janjam SVSB, Peethala BC, Zheng JP, Babu SV, Roy D Materials Chemistry and Physics, 123(2-3), 521, 2010 |
| 3 |
Oxalic-acid-based slurries with tunable selectivity for copper and tantalum removal in CMP Janjam SVSB, Surisetty CVVS, Pandija S, Roy D, Babu SV Electrochemical and Solid State Letters, 11(3), H66, 2008 |
| 4 |
Tartaric Acid as a Complexing Agent for Selective Removal of Tantalum and Copper in CMP Janjam SVSB, Peddeti S, Roy D, Babu SV Electrochemical and Solid State Letters, 11(12), H327, 2008 |