검색결과 : 8건
No. | Article |
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1 |
Ionization cross section of radicals produced by hexamethyldisiloxane dissociation Jauberteau JL, Jauberteau I Chemical Physics Letters, 604, 116, 2014 |
2 |
Comparison of Hexamethyldisiloxane Dissociation Processes in Plasma Jauberteau JL, Jauberteau I Journal of Physical Chemistry A, 116(35), 8840, 2012 |
3 |
Atomic force microscopy investigations on nanoindentation impressions of some metals: effect of piling-up on hardness measurements Jauberteau I, Nadal M, Jauberteau JL Journal of Materials Science, 43(17), 5956, 2008 |
4 |
Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias Tristant P, Ding Z, Vinh QBT, Hidalgo H, Jauberteau JL, Desmaison J, Dong C Thin Solid Films, 390(1-2), 51, 2001 |
5 |
Reaction rate constant for Ar(P-3(2)) metastable atoms with the tetramethylsilane molecule Jauberteau JL, Jauberteau I, Aubreton J Chemical Physics Letters, 327(5-6), 351, 2000 |
6 |
Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity Jauberteau I, Cinelli MJ, Cahoreau M, Jauberteau JL, Aubreton J Journal of Vacuum Science & Technology A, 18(1), 108, 2000 |
7 |
High reactivity of CH2 radical in an AR-CH4 post-discharge Jauberteau JL, Thomas L, Aubreton J, Jauberteau I, Catherinot A Plasma Chemistry and Plasma Processing, 18(1), 137, 1998 |
8 |
Characterization of an Argon-Hydrogen Microwave-Discharge Used as an Atomic-Hydrogen Source - Effect of Hydrogen Dilution on the Atomic-Hydrogen Production Thomas L, Jauberteau JL, Jauberteau I, Aubreton J, Catherinot A Plasma Chemistry and Plasma Processing, 17(2), 193, 1997 |