| 1 |
Metal-organic chemical vapour deposition of (BInGa)P: Density-functional calculations to the mechanisms
Jenichen A, Engler C
Journal of Crystal Growth, 312(1), 10, 2009 |
| 2 |
Metalorganic chemical-vapour-deposition (MOCVD) of InGaAs, BGaAs, and BInGaAs: Quantum chemical calculations on the mechanisms
Jenichen A, Engler C
Journal of Crystal Growth, 304(1), 26, 2007 |
| 3 |
Etching of the InP(001) surface by halogens: Reaction mechanisms obtained by density-functional calculations
Jenichen A, Engler C
Journal of Physical Chemistry B, 108(4), 1380, 2004 |
| 4 |
Etching of GaAs(100) surfaces by halogen molecules: Density functional calculations on the different mechanisms
Jenichen A, Engler C
Journal of Physical Chemistry B, 105(10), 1956, 2001 |
| 5 |
Etching of GaAs(100) surfaces by Cl-2: Quantum chemical calculations on the mechanisms
Jenichen A, Engler C
Journal of Physical Chemistry B, 104(34), 8210, 2000 |
| 6 |
Mechanisms of SiO2 Etching - Ab-Initio Calculations on the Reactions of Cfm- (M=3-1) and Nfn- (N=2, 1) Ions with Local Surface Models
Jenichen A
Journal of Physical Chemistry B, 101(27), 5377, 1997 |
| 7 |
Modeling of Etching Reactions - Ab-Initio Calculations of the Reactions of Cfm+ (M=1-3)and Nfn+ (N=1,2) with Local Models of SiO2 Surface-Structures
Jenichen A
Journal of Physical Chemistry, 100(23), 9820, 1996 |
