검색결과 : 4건
No. | Article |
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1 |
딥러닝 예측 기반의 OLED 재료 분자구조 가상 스크리닝 전예린, 이규황, 이호경 Korean Chemical Engineering Research, 58(2), 230, 2020 |
2 |
Influence of oxygen vacancies in ALD HfO2-x thin films on non-volatile resistive switching phenomena with a Ti/HfO2-x/Pt structure Sokolov AS, Jeon YR, Kim S, Ku B, Lim D, Han H, Chae MG, Lee J, Ha BG, Choi C Applied Surface Science, 434, 822, 2018 |
3 |
Influence of in-situ NH3 plasma passivation on the electrical characteristics of Ga-face n-GaN MOS capacitor with atomic layer deposited HfO2 Jung WS, Lim D, Han H, Sokolov AS, Jeon YR, Choi C Solid-State Electronics, 149, 52, 2018 |
4 |
Comparative study of Al2O3, HfO2, and HfAlOx for improved self-compliance bipolar resistive switching Sokolov AS, Son SK, Lim D, Han HH, Jeon YR, Lee JH, Choi C Journal of the American Ceramic Society, 100(12), 5638, 2017 |