화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 딥러닝 예측 기반의 OLED 재료 분자구조 가상 스크리닝
전예린, 이규황, 이호경
Korean Chemical Engineering Research, 58(2), 230, 2020
2 Influence of oxygen vacancies in ALD HfO2-x thin films on non-volatile resistive switching phenomena with a Ti/HfO2-x/Pt structure
Sokolov AS, Jeon YR, Kim S, Ku B, Lim D, Han H, Chae MG, Lee J, Ha BG, Choi C
Applied Surface Science, 434, 822, 2018
3 Influence of in-situ NH3 plasma passivation on the electrical characteristics of Ga-face n-GaN MOS capacitor with atomic layer deposited HfO2
Jung WS, Lim D, Han H, Sokolov AS, Jeon YR, Choi C
Solid-State Electronics, 149, 52, 2018
4 Comparative study of Al2O3, HfO2, and HfAlOx for improved self-compliance bipolar resistive switching
Sokolov AS, Son SK, Lim D, Han HH, Jeon YR, Lee JH, Choi C
Journal of the American Ceramic Society, 100(12), 5638, 2017