화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Profile evolution simulation of oxide fencing during via-first dual damascene etching processes
Jin WD, Sawin HH
Journal of the Electrochemical Society, 150(11), G711, 2003
2 Feature profile evolution in high-density plasma etching of silicon with Cl-2
Jin WD, Sawin HH
Journal of Vacuum Science & Technology A, 21(4), 911, 2003
3 Plasma-surface kinetics and simulation of feature profile evolution in Cl-2+HBr etching of polysilicon
Jin WD, Vitale SA, Sawin HH
Journal of Vacuum Science & Technology A, 20(6), 2106, 2002
4 Study of adsorption equilibrium and dynamics of benzene, toluene, and xylene on zeolite NaY
Jin WD, Zhu SL
Chemical Engineering & Technology, 23(2), 151, 2000