검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Mechanism of reducing line edge roughness in ArF photoresist by using CF3I plasma Soda E, Kondo S, Saito S, Koyama K, Jinnai B, Samukawa S Journal of Vacuum Science & Technology B, 27(5), 2117, 2009 |
| 2 |
Damage mechanism in low-dielectric (low-k) films during plasma processes Jinnai B, Nozawa T, Samukawa S Journal of Vacuum Science & Technology B, 26(6), 1926, 2008 |
| 3 |
On-wafer monitoring of electron and ion energy distribution at the bottom of contact hole Ohtake H, Jinnai B, Suzuki Y, Soda S, Shimmura T, Samukawa S Journal of Vacuum Science & Technology B, 25(2), 400, 2007 |
| 4 |
On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process Jinnai B, Orita T, Konishi M, Hashimoto J, Ichihashi Y, Nishitani A, Kadomura S, Ohtake H, Samukawa S Journal of Vacuum Science & Technology B, 25(6), 1808, 2007 |
| 5 |
Real-time monitoring of charge accumulation during pulse-time-modulated plasma Ohtake H, Jinnai B, Suzuki Y, Soda S, Shimmura T, Sarnukawa S Journal of Vacuum Science & Technology A, 24(6), 2172, 2006 |