검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data Ho P, Johannes JE, Buss RJ, Meeks E Journal of Vacuum Science & Technology A, 19(5), 2344, 2001 |
| 2 |
Gas-Phase Reaction Study of Disilane Pyrolysis - Applications to Low-Pressure Chemical-Vapor-Deposition Johannes JE, Ekerdt JG Journal of the Electrochemical Society, 141(8), 2135, 1994 |