검색결과 : 2건
No. | Article |
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1 |
Marks for Alignment and Registration in Projection Electron Lithography Farrow RC, Liddle JA, Berger SD, Huggins HA, Kraus JS, Camarda RM, Tarascon RG, Jurgensen CW, Kola RR, Fetter L Journal of Vacuum Science & Technology B, 11(6), 2175, 1993 |
2 |
Patterning of X-Ray Masks Using the Negative-Acting Resist P(Si-CMS) Mixon DA, Novembre AE, Tai WW, Jurgensen CW, Frackoviak J, Trimble LE, Kola RR, Celler GK Journal of Vacuum Science & Technology B, 11(6), 2834, 1993 |