화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Engineering Plant Alternative Oxidase Function in Mammalian Cells: Substitution of the Motif-like Sequence ENV for QDT Diminishes Catalytic Activity of Arum concinnatum AOX1a Expressed in HeLa Cells
Kakizaki Y, Ito K
Applied Biochemistry and Biotechnology, 170(5), 1229, 2013
2 Crystal Transformation and Host Molecular Motions in CO2 Adsorption Process of a Metal Benzoate Pyrazine (M-II = Rh, Cu)
Takamizawa S, Nataka E, Akatsuka T, Miyake R, Kakizaki Y, Takeuchi H, Maruta G, Takeda S
Journal of the American Chemical Society, 132(11), 3783, 2010
3 Full-field exposure performance of electron projection lithography tool
Suzuki K, Hirayanagi N, Fujiwara T, Yamada A, Ikeda J, Yahiro T, Kojima S, Udagawa J, Yamamoto H, Katakura N, Suzuki M, Aoyama T, Takekoshi H, Umemoto T, Shimizu H, Fukui S, Suzuki S, Okino T, Ohkubo Y, Shimoda T, Tanida T, Watanabe Y, Kohama Y, Ohmori K, Mori F, Takemoto S, Yoshioka T, Hirose H, Morita K, Hada K, Kawata S, Kakizaki Y, Miura T
Journal of Vacuum Science & Technology B, 22(6), 2885, 2004
4 First dynamic exposure results from an electron projection lithography tool
Suzuki K, Fujiwara T, Kojima S, Hirayanagi N, Yahiro T, Udagawa J, Shimizu S, Yamamoto H, Suzuki M, Takekoshi H, Fukui S, Hamashima M, Ikeda J, Okino T, Shimizu H, Takahashi S, Yamada A, Umemoto T, Katagiri S, Ohkubo Y, Shimoda T, Hirose K, Tanida T, Watanabe Y, Kaminaga T, Kohama Y, Mori F, Takemoto S, Yoshioka T, Hirose H, Morita K, Hada K, Kawata S, Sato T, Sato Y, Tokunaga M, Okamoto K, Kakizaki Y, Miura T
Journal of Vacuum Science & Technology B, 21(6), 2686, 2003
5 Ion-Implantation and Annealing Conditions for Delamination of Silicon Layers by Hydrogen-Ion Implantation
Hara T, Kakizaki Y, Kihana T, Oshima S, Kitamura T, Kajiyama K, Yoneda T, Sekine K, Inoue M
Journal of the Electrochemical Society, 144(4), L78, 1997
6 Delaminations of Thin-Layers by High-Dose Hydrogen-Ion Implantation in Silicon - Formation of Thin Silicon-on-Insulator Silicon Layers
Hara T, Onda T, Kakizaki Y, Oshima S, Kitamura T, Kajiyama K, Yoneda T, Sekine K, Inoue M
Journal of the Electrochemical Society, 143(8), L166, 1996