| 1 |
New transparent conducting ZnO-In2O3-SnO2 thin films prepared by magnetron sputtering
Minami T, Kakumu T, Shimokawa K, Takata S
Thin Solid Films, 317(1-2), 318, 1998 |
| 2 |
Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering
Minami T, Kakumu T, Takeda Y, Takata S
Thin Solid Films, 317(1-2), 326, 1998 |
| 3 |
New Materials Consisting of Multicomponent Oxides for Thin-Film Gas Sensors
Miyata T, Minami T, Shimokawa K, Kakumu T, Ishii M
Journal of the Electrochemical Society, 144(7), 2432, 1997 |
| 4 |
Preparation of Highly Transparent and Conducting Ga2O3-In2O3 Films by Direct-Current Magnetron Sputtering
Minami T, Takeda Y, Kakumu T, Takata S, Fukuda I
Journal of Vacuum Science & Technology A, 15(3), 958, 1997 |
| 5 |
Highly Transparent and Conductive ZnO-In2O3 Thin-Films Prepared by Atmospheric-Pressure Chemical-Vapor-Deposition
Minami T, Kumagai H, Kakumu T, Takata S, Ishii M
Journal of Vacuum Science & Technology A, 15(3), 1069, 1997 |
| 6 |
Preparation of transparent conducting In4Sn3O12 thin films by DC magnetron sputtering
Minami T, Takeda Y, Takata S, Kakumu T
Thin Solid Films, 308-309, 13, 1997 |
| 7 |
New Multicomponent Transparent Conducting Oxide-Films for Transparent Electrodes of Flat-Panel Displays
Minami T, Takata S, Kakumu T
Journal of Vacuum Science & Technology A, 14(3), 1689, 1996 |
| 8 |
Preparation of Transparent and Conductive In2O3-ZnO Films by Radio-Frequency Magnetron Sputtering
Minami T, Kakumu T, Takata S
Journal of Vacuum Science & Technology A, 14(3), 1704, 1996 |
| 9 |
Highly Transparent and Conductive ZrO-In2O3 Thin-Films Prepared by DC Magnetron Sputtering
Minami T, Kakumu T, Takeda Y, Takata S
Thin Solid Films, 290-291, 1, 1996 |
| 10 |
New Transparent Conducting MgIn2O4-Zn2In2O5 Thin-Films Prepared by Magnetron Sputtering
Minami T, Takata S, Kakumu T, Sonohara H
Thin Solid Films, 270(1-2), 22, 1995 |
