| 1 |
Electrochemical Behavior of the Hexafluorouranate Anion in 1-Butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)amide Room Temperature Ionic Liquid
Kanatani T, Matsumoto K, Nohira T, Hagiwara R
Electrochemical and Solid State Letters, 14(3), F1, 2011 |
| 2 |
Syntheses and Physicochemical Properties of New Ionic Liquids Based on the Hexafluorouranate Anion
Kanatani T, Matsumoto K, Hagiwara R
Chemistry Letters, 38(7), 714, 2009 |
| 3 |
Effects of type of reactor, crystallinity of SiC, and NF3 gas pressure on etching rate and smoothness of SiC surface using NF3 gas plasma
Tasaka A, Yamada H, Nonoyama T, Kanatani T, Kotaka Y, Tojo T, Inaba M
Journal of Vacuum Science & Technology A, 27(6), 1369, 2009 |
| 4 |
Effect of oxygen concentration on the spike formation during reactive ion etching of SiC using the mixed gas plasma of NF3 and O-2
Tasaka A, Watanabe E, Kai T, Shimizu W, Kanatani T, Inaba M, Tojo T, Tanaka M, Abe T, Ogumi Z
Journal of Vacuum Science & Technology A, 25(2), 391, 2007 |
| 5 |
Molecular recognition with lanthanide(III) tris(beta-diketonate) complexes : Extraction, transport, and chiral recognition of unprotected amino acids
Tsukube H, Shinoda S, Uenishi J, Kanatani T, Itoh H, Shiode M, Iwachido T, Yonemitsu O
Inorganic Chemistry, 37(7), 1585, 1998 |
