화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope
Kolanek K, Tallarida M, Karavaev K, Schmeisser D
Thin Solid Films, 518(16), 4688, 2010
2 Optimization of the AION buffer layer for PrXOY/Si stacks
Henkel K, Burkov Y, Karavaev K, Torche M, Schwiertz C, Schmeisser D
Journal of Vacuum Science & Technology B, 27(1), 253, 2009
3 HfO2/Si interface formation in atomic layer deposition films: An in situ investigation
Tallarida M, Karavaev K, Schmeisser D
Journal of Vacuum Science & Technology B, 27(1), 300, 2009